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Ion beam assisted deposition equipment Ion beam assisted deposition refers to the technology of bombardment with low energy ion beam at the same time of vapor deposition to form simple or compound thin films, and the on-line structure analysis can be carried out by reflective high energy elect Design parameters
	Pulsed laser deposition equipment Pulsed laser deposition is a method that uses high power pulsed laser to evaporate the material and form a thin film on the substrate. This technology has a wide range of applications, ranging from elements, oxides, nitrides to polymers, and because it Design parameters
Magnetron sputtering coating equipment Sputtering coating is a technique in which the bombarded particles are deposited on the substrate by bombarding the target surface with energetic particles in vacuum. Sputtering coating has the advantages of strong adhesion of film and substrate and goo Design parameters
	Evaporation coating equipment Evaporation coating is a technology in which the coating material is heated by resistance or electron beam in vacuum, and its atoms or molecules are evaporated from the surface and deposited on the surface of the substrate to form a thin film. this techno Design parameters

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